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Ultra-intense and Ultra-fast
Laser Development
Presenter: Yuxin Leng
Xiaoyan Liang, Jiansheng Liu, Ruxin Li and
Zhizhan Xu
State Key lab of high field laser physics
Shanghai Institute of Optics and Fine Mechanics, China
Outline
Introduction
High Power Femtosecond Laser
High Power Few-cycles Laser and Carrier
Envelop Phase Stability
Further development
SIOM
SIOM
The location of SIOM
Shanghai Institute of
Optics and Fine
Mechanics(SIOM),
Chinese Academy of
Sciences, Shanghai
201800, P. R. China
Established in 1964
• Basic research laboratories1) the State Key Laboratory for High Field Physics
2) the CAS Key Laboratory for Quantum Optics
3) the Laboratory for Information Optics
• Hi-tech application and innovation research laboratories 1) the Laboratory for High Power Laser Physics
2) the High Density Optical Storage Laboratory
3) the Advanced Laser Technology and Application System Laboratory
• Research and development (R&D) centers1) the High Power Laser Component Technology Center
2) the Precision Optoelectronic Measurement and Control Center
3) the Laser & Optoelectronic Material Center
4) the Optical Coating Technique Center
Brief Introduction
State Key Laboratory
of High Field Laser Physics
Physics and technology of ultra-fastultra-intense light sources
Ultra-fast high-field laser physics
Basic physics of related high-tech fields
Ultra-fast processes and basic research in interdisciplinary fields.
Main Research Fields:
High Power Femtosecond Laser
1960
Theodore Maiman
First Laser
Milestones in Development of ultra-
intense and ultra-fast laser
1917
Albert Einstein
Original Concept of Light
Amplification by Stimulated
Emission of Radiation (LASER)
http://www.rp-photonics.com
http://laserfest.org/lasers/history/timeline.cfm
http://www.crystalsystems.com/ti_sapphire_products.html
Milestones in Development of ultra-
intense and ultra-fast laser
1962
Q-switch
ns,106W/cm2
1963
Mode locking
ps/fs,1012W/cm2
1985
Mourou
Chirped Pulse
Amplification
1986
Ti:sapphire
http://www.rp-photonics.com
http://laserfest.org/lasers/history/timeline.cfm
http://www.crystalsystems.com/ti_sapphire_products.html
Chirped pulse amplification
Chirped Pulse Amplification:
Laser material: Ti:Sapphire, Nd:glass for
broadband gain.
CPA+OPA=OPCPA
(Optical parametric chirped pulse amplification)
Parametric Pulse Amplification (OPA):
Nonlinear crystal: BBO, LBO, KDP
Intensity
T. Tajima and G. Mourou, Physical Review Special Topics, Vol. 5,
031301 (2002)Proton: EQ=mpc2, intensity~1024W/cm2
1018W/cm2
2*1022 W/cm2
Local electronic field: 1012V/cm;
Local magnetic field: 109 Gauss;
High energy density: 3×1010J/cm3;
Press: 1012 atm;
Electronic quiver energy: >10MeV(>>0.5MeV, Electron rest energy) forrelativistic optics ;
Electron acceleration: 1022m/s2;
1021W/cm2 Vs Extreme conditions
SCIENCE 301, 154( 2003)
全世界激光实验室展开拍瓦级激光竞赛
PW(1015W)
2.8 TW/43fs, 10Hz,
1996 BMI
5.4 TW/46fs, 10Hz,
199816 TW/33.9fs, 10Hz,
2001
23 TW/33.9fs, 10Hz,
2002 120 TW/36fs, single
shot, 2004
890 TW/29fs, single
shot, 2006
0.1 TW/20ps,
1991
16.7 TW/120fs, OPCPA
laser, 2002
Roadmap of Ultraintense Ultrashort Lasers in SIOM
150J Nd:glass pump/Single shot
Stretcher
OscillatorCompressor
Target
Nd:YAG pump
Amplifiers /10Hz
Power Amplifiers/Single shot
Peta-Watt Ti:Sapphire CPA Laser System
Schematic of PW Laser system
Oscillator
Nd:YAG pump
532nm/10Hz
5-pass
Amplifier
Nd:YAG pump
532nm/10Hz
800nm
~ 25.8J/~29.0fs/ ~ 0.89PW
Reg.Amp
Compressor800nm
0.4J/~23fs/ ~17TW
10Hz
Power
Amplifier
Nd:glass
Pump Laser
527nm
~100J/~20nsSingle shot
10Hz
Final
Amplifier
Compressor
800nm/l~100nm
10nJ/9-12fs 0.5nJ
~2ns 800nm/4mJ
60mJ
800mJ,~1ns
~20J~75J
~35.9J,1ns
2 1.2
~2J,1ns
AOPDF stretcher
680 700 720 740 760 780 800 820 840 860 880 9000.0
0.2
0.4
0.6
0.8
1.0
No
rma
lize
d i
nte
ns
ity
Wavelength (nm)
oscillator
after stretcher
After stretcher:90nm
Oscillator:110nm
Key Tech - Spectra Shaping
Spectrum from oscillator is 110nm, and spectrum after stretcher is 90nm
Ti:S
532nm/10Hz/50mJ
Birefringent
Plate
PC
TFP
Signal
4mJ
Spectra Shaping in Reg. Amp.
Cavity design : High energy
Birefringent Plate: Spectrum shaping
Result:
Input Pump Ti:sapp Pass Output Gain
~0.5nJ/90nm 50 mJ f10*9 (mm) 14 4.0mJ/65nm 107
1 0
2 0
3 0
exp ;
exp 2 ;
exp 3 ;
G n L
G n L
G n L
700 720 740 760 780 800 820 840 860 880 9000.0
0.2
0.4
0.6
0.8
1.0
No
rmal
ized
In
ten
sity
Wavelength (nm)
28nm
65nm
No shaping:28nm
shaped:65nm
Spectra comparison of Reg.
Comparison: Birefringent Plate is effective for broaden
the output spectrum of regenerative amplifier
Gain narrowing effect
●
●
●
0expNG N n L stimulated-emission cross section
1.2/10Hz@532nm 1.2/10Hz@532nm
Pre - Amplifier
Divergence of injected beam →Thermal lens compensation
High pump intensity → high gain
Input Pump Ti:sapphire Pass Output Gain
~4mJ/65nm 2.1J f25*15(mm) 5 800mJ/65nm 200
Ti:Sapphire
700 720 740 760 780 800 820 840 860 880 9000.0
0.2
0.4
0.6
0.8
1.0
N
orm
ali
zed
In
ten
sity
Wavelength (nm)
Pre-Amp. : 65nm
Reg. Amp. : 65nm
Spectra comparison
Spectrum from Pre Amp. maintain same bandwidth, and have better shape.
Key Tech - Suppress Parasitic Lasing
Lower gainFresnel Reflection + large size PL
f80mm×33mm42×50×23mm
Spontaneous emission will be generated and amplified in traverse direction in crystal.
Power Amplifier - 5J
Input Pump Ti:S (mm) Pass Output Gain
300~400mJ 15J/26mm 42*50*23 4 5J/24mm 12-15
Suppress PL ——
absorption coated at
Ti:Sapp side surfaces
gain:3 15
1.4 1.5 1.6 1.7 1.8 1.9 2.0 2.15.0
5.5
6.0
6.5
7.0
7.5
8.0
8.5
9.0
Ga
in
Pump Fluence(J/cm2)
Suppress Parasitic Lasing
30 35 40 45 50 55 60 65 70 7510
15
20
25
30
35
40
Ou
tpu
t e
ne
rgy
(J)
Pump energy(J)
0 20 40 60 80 100 120 140 160
0
2
4
6
8
10
12
14
16
18
20
ou
tpu
t en
erg
e (J
)
Time (minutes)
±5%
Input Pump Ti:Sapp Pass Output Gain Eff.
~2J/50mm 72J/60mm F80*33 3 35.9J 18 ~50%
Suppress Parasitic Lasing
Final Amplifier – 35.9J
220x165
420x210
f150
Key Tech - Dispersion Compensation
Insert angle: 24.1o
Distance between grating:513mm
-200 -150 -100 -50 0 50 100 150 200
0.0
0.2
0.4
0.6
0.8
1.0
Norm
aliz
ed I
nte
nsity
Time (fs)
Without AOPDF:
Pulse width:29.5fs
Compressed Energy: 25.8J
With AOPDF:
Pulse width:29.0fs
29.0fs
-200 -150 -100 -50 0 50 100 150 200
0.0
0.2
0.4
0.6
0.8
1.0
No
rma
lize
d I
nte
ns
ity
Time (fs)
29.5fs
0.89PW
Pulse width-29.0fs
Peak
Power
Energy/pulse
durationLocation
1 0.85PW 28.4J/33fs JAERI (Japan) 2003.3
2 0.89PW 25.8J/29fs SIOM (China) 2006
3 0.72PW 22.5J/31fs IOP (China) 2008
4 ~0.62PW ~24.7J/40fs LIXAM/LOA(France) 2007.2
5 0.5 PW×2 15J/30fs RAL (UK) 2007.10
6 1.1PW 33J/30fs APRI (KOREA) 2010.4
710PW
(ILE)200J/20fs LOA (France) In building
Femtosecond PW-level ultra-intense and ultra-fast
lasers in the world
—Based on Ti:Sapphire, <100fs, >0.5 PW
Output beam (f150mm) is focused by F/4 OAP, which
transform limit is ~7.8μm (1/e2).
Peta-Watt Ti:Sapphire CPA Laser System
M2<2; Strehl Ratio (SR) = real peak intensity/ideal peak intensity ~ 0.3
Adaptive Optics to Improve Focus
Oscillator and Amplifiers Compressor
Focal spot
DM
f150mm
Control System
Larger size DM;
Larger space;
Wavefront Correction with smaller size DM
PW Laser Compressor
Focal spot
DM
Control System
OAP
sensor
Ptv=0.948l, rms=0.092l, SR=0.72Ptv=1.237l, rms=0.183l, SR=0.31
Measured Wavefront
Focused Spot Size Measurement
Before: 14.73×12.0 m2 After: 9.70×10.50 m2
Mx=1.89; My=1.54; M2=1.7; SR=0.31; Mx=1.24; My=1.35; M2=1.3; SR=0.72;
>1021W/cm2 by F=4 OAP;
Contrast ratio
Donald Umstadter, Physics of Plasmas, Vol. 8, pp.1774-1785 , 2001
TW-level Ti:Sapphire CPA Laser System
Measure by third-order femtosecond cross-correlator (Sequoia) at 800nm/10Hz;
Yi Xu, et. al., Chinese optics letter, 2010;
Pre pulse generation:
• ASE during amplification (far);
• Multi reflection of optics surface;
• Uncompensated high order
dispersion (close);
Optimize the laser.
-450 -400 -350 -300 -250 -200 -150 -100 -50 0 50 100 150 200
1E-9
1E-8
1E-7
1E-6
1E-5
1E-4
1E-3
0.01
0.1
1
Inte
nsity
ps
B
False pulses
Contrast ratio for TW/10Hz laser
36
C: Final amplifier and pump laser
A: Oscillator and Stretcher B: Regen and pre amplifiers
25.8J / 29.0fs, 0.89PWOptics Express 15, 15335 (2007)
Peta-Watt Ti:Sapphire CPA Laser System
Compressor and interaction chamber
0 1 2 3 4 5 60
20
40
60
80
100
Maximum Kinetic energy
Ion
En
erg
y (
keV
)
Laser Energy (J)
Averge Kinetic energy
The single shot neutron yield 5.5 106 neutrons with a 100TW/50 fs driving
laser pulse at the intensity of 1.5×1019W/cm2 .
The backing pressure of CD4 gas: 80 bars. D+ ions density : ~2.4 ×1019 cm-3,cluster radius: 7nm,=50fs, Ipeak=1.5×1019W/cm2
Measured fusion neutron yields and kinetic energies of
D+ ions as a function of incident laser energy.
0.1 1 1010
3
104
105
106
107
Fu
sio
n N
eutr
on
Yie
ld
Laser Energy (J)
Madison et al. , Phys.
Plasmas (2004)
4104 /J
2.1106neutrons/J
Ditmire et al.,
Nature (1999)
CD4
CD4
D2
D2
Disadvantages of Ti:sapphire CPA laser
Limited gain bandwidth and gain narrowing effect
(amplified pulses re-compressed to > 20 fs);
Thermal effect;
Special optical/electro-optical components necessary to
improve ps-ns intensity contrast
Currently available Ti:sapphire rods ≤ 200 mm diameter
Self lasing
Working wavelength is fixed (800nm for Ti:sapphire)
Limiting focus intensity!
OPCPA vs CPA
Advantages of OPCPA:
Ultra-broad gain bandwidth
(amplified pulses re-compressed
down to 5-15 fs)
Considerable decrease in thermal
loading
Significantly lower level of ASE
Very high gain
No self-lasing
High aperture DKDP crystals are
available
Tunable
Disadvantages of OPCPA:
- Exigent requirements:
-High precision pump-signal pulse
synchronization
- High beam quality of pump lasers
- Short (ps-ns) pump pulse duration
Intricate Front-End to generate ultra-
broad bandwidth signal pulse and optically
synchronized pump pulse
Low pulse to pulse stability?
- High spectral sensitivity of OPCPA to
small changes of the cross-angle between
interacting waves
- High-energy amplification chain is based
on a cascade of nonlinear optical processes
Possible for higher focus intensity!
OPCPA laser (16.7TW/120fs) (2002)
Optics Letters, 27(13), 1135-1137 (2002); Chinese Optics Letters, 1(1), 19-22(2003);
All optically synchronization scheme for 1064nm OPCPA
pumped by Nd: YAG-Nd: Glass hybrid Laser
Nd:YAG
Rege Amp.
Pulse shaping
Nd:YAG Amp.
(2/800ps/1Hz)
1064nm
femtosecond
oscillator
Pulse
stretcher
First
OPCPA
(LBO)
f3x18mm
Second
OPCPA
(LBO)
f4x15mm
Third
OPCPA
(LBO)
φ10x20mm
Pulse
Compressor
Nd:YAG Amp.
(2/800ps/1Hz)Nd:Glass Amp.
1000pJ
100fs30mJ
50pJ/0.3ns 0.01mJ 10mJ3.14J/0.3ns
2.01J/120fs
1064nm120fs16.7TW
YAG-Glass hybrid laser as a pump
120mJ
12J/0.8ns
532nm
OPA I OPA II OPA III
Spectral width of
injected pulse18nm 18nm 18nm
Energy of the injected
pulse50pJ 10 J 8mJ
Pump laser energy 30mJ 120mJ 12.3J
Pump laser intensity 3GW/cm2 4.2GW/cm2 4GW/cm2
Length of the OPA
crystals18mm 15mm 20mm
Output laser energy 10J 10mJ 3.1J
Spectral width of the
output laser pulse18nm 18nm 20nm
Energy Gain 2105 1000 ~400
Parameters of the OPCPA amplifier stages
Seed:1064nm,100fs/18nm, Mira 900
Seed after stretcher:1064nm,300ps Pump laser:532nm,800ps
OPCPA scalability to multi-petawatt power.Sarov – N.Novgorod.
Second phase (0.56PW)38J
0.5ns Compressor
0.5ns 50fs2Nd:glass
amplifier
300J
1ns
180J
1ns 24J
43fsOPA III
KD*P
10cm dia
2
Cr:Forsterite
fs-laser
l=1250nm
Stretcher
40 fs 0.5 ns
2nJ
40 fs 1nJ
0.5 nsNd:YLF
Q-switch laser
l=1053nm
1 J
1.5ns
Synchronization
system
Two-stage
Nd:YLF
amplifier
First phase ( TW level)
32 mJ
70 fs
2 HzOPA I
KD*PCompressor
0.5 ns 70 fs
l=911nm
0.8mJ
0.5ns
2J
1.5 ns
OPA II
KD*P
CW Yb:fiber pump
10W
l=1050…1080nm
l=1250nm
l=911 nm
70 mJ
0.5 ns
1mJ
1.5ns
10mJ
12ns
Pulse shaper
Third phase ( 2 PW)
2Nd:glass
amplifier
2kJ
1.5ns1kJ
1.5ns
150J
0.5ns
100J
50fsCompressor
0.5ns 50fsOPA IV
KD*P
20cm dia
Nd:YLF
Q-switch laser
l=1053nm
10mJ
12ns
Pulse shaper Nd:YLF
amplifier
LWS-20 Double CPA & OPCPA Setup
150 mJ
Acknowledgements:
V. Pervak (LMU), M. Scharrer (Univ. Erlangen)
532 nm
Pump700-1020 nm
Seed
1st stage
Laszlo Veisz, ICUIL Oct 27-31 2008, Shanghai-Tongli, China; OPTICS LETTERS, 2009, 34(16), 2459
Laszlo Veisz, ICUIL Oct 27-31 2008, Shanghai-Tongli, China; OPTICS LETTERS, 2009, 34(16), 2459
IN:
low-contrast
pulse at
OUT:
clean pulse
- at
- polarization
Cross-polarized wave generation
LWS-20 Double CPA & OPCPA Setup
180 mm
520 mm
200 mm
520 mm
DM1DM2
SFG1
G2
G2bG3
G4
G3b
Vacuum compression / spatial beam control
150J / 15 fs @1shot/mn
10 PW
Ampli 0
2J /1Hz
Nd YAG
6J/1Hz
Ampli 1
«LASERIX »
50J /0.1Hz
Nd Glass
100J/0.1Hz
Ampli 2
600J -1shot/mn
Nd Glass
1.5KJ – 1shot/mn
Amplifiers
synchronized
OPCPA
Amplification stages
LBO/BBO
KHz Ti:Sa
30 fs @ 800 nm
500 µJ
Spectral broadening
< 10 fs @ 800 nm
100 µJ, kHz
Yb:KGW
Diode pumped
300 fs, 200 µJ
@ 1030 nm
Amplis Yb:KGW
Yb:YAG
Diode pumped
2 J @ 1030 nm
1Hz
10 fs
@ 800 nm
100 mJ,
1Hz
Front End
Compression
and SHG
1 à 100 ps
1 J @ 515 nm
1 Hz
ILE APOLLON Single beamline 10PW laser
Double CPAHybrid: OPCPA & Ti:S
LEI Conference , Brasov (RO) October 21rst, 2009
Z. Major, LEI, Oct 2009, Brasov
Yb:YAG, 1030 nm, ~3.5 nm bandwidth
Basic concept and layout of Petawatt
Frequency Synthesizer - PFS MPQ Garching,
Germany
Double CPA Hybrid: OPCPA & Ti:S
Hiromitsu Kiriyama, “Generation of high-contrast and high-intensity laser pulses using an OPCPA preamplifier in a
double CPA, Ti:sapphire laser system”, Optics Communications 282 (2009) 625–628.
Contrast radio: ~1010-11
60TW/10Hz/30fs
Double CPA Hybrid: OPCPA & Ti:S
High Power Few-cycles Laser and Carrier Envelop Phase Stability
1fs
single cycles laser (800nm/2.7fs)
0.65fs(650as)
Nature 414, 2001
0.25fs(250as)
Nature 427, 2004Attosecond0.13fs
(130as)Science, Oct., 2006
Sub-100as(~80as)
Science, June, 2008Attosecond pulse in XUV generated by few cycle laser
Few cycles laser
[E(t)=Ea(t)cos(Lt+)] Nature 414, 182(2001)
Carrier Envelop Phase
CEP stability measurement
F-2F interferometer
Science. 2000, Vol. 288, No. 5466, 635-639. Appl. Phy. B, 1999, 69(4), 327-332.
Single path
Two paths
1-3um working wavelength is a balance.
Tunable and longer working wavelength
Few cycle laser with actively
stabilized CEP
Nature, 2003, 421(6):611-616
Few cycle laser with actively
stabilized CEP
Applied Physics B, Volume 99, Numbers 1-2, 149-157.
WP1
iris
WP2M1M2
M3 M4
M5
Hollow fiber tube filled with Neon
Chirped mirrorswedges2.5mJ, <25fs
1mJ, 4.3fs
-30 -20 -10 0 10 20 300
2
4
6
8
fit
measured
Inte
nsi
ty (
a.u
.)
Delay (fs)
~4.3fs
Few cycle laser with passively
stabilized CEP
Opt. Express, 2006,14(21):10109-10116
Based on different frequency generation (DFG)
Few cycle laser with passively
stabilized CEP
Appl. Phys. Lett. 2007, Vol. 90, 171111
OPA:
2
I P S
I P S
2
I P S
I P S
Few cycle laser with passively
stabilized CEP
Appl. Phys. Lett. 2007, Vol. 90, 171111
Ti:Sa laser
6.8mJ/40fs
@800nm, 1kHz
Sa
λ/2
NOPA1
NOPA2
Fiber filter
WLC
Output pulse energy >1.2mJ (1.5 - 1.7m)Time delay line
Time delay line
6.6mJ
Few cycle laser with passively
stabilized CEP
1000 1200 1400 1600 1800 2000 2200 24000.0
0.2
0.4
0.6
0.8
1.0
Inte
ns
ity
Wavelength(nm)
1200 1300 1400 1500 1600 1700 1800 1900 2000 2100 2200 2300 2400
0.0
0.1
0.2
0.3
0.4
0.52400 2080 1867 1714 1600 1511 1440 1382 1333 1292 1257 1227 1200
0.0
0.1
0.2
0.3
0.4
0.5
Idler wavelength
Perc
entium
Signal wavelength
siganal
idler
total
CEP stability measurement
1400 1500 1600 1700 1800 1900
0
200
400
600
800
1000
1200
1400
CE
P(
mra
d)
Wavelength(nm)
1000f_delay0s (60s)
100f_delay0s (6s)
100f_delay1s (100s)
600f_delay1s (10min)
CEP is more unstable for the shorter wavelength idler pulses, and it can be due to the unstable
intensity of the seed from the WLC generation. The small envelope 1.5m-2.0m is the 2nd
diffraction of the wavelength 0.7m-1.0m.
CEP fluctuation ~0.103rad (rms) for 1.8m pulses
in 10 mins.
*Measured CEP stability is sensitive to the
environment.
400 800 1200 1600 2000 2400 2800
0.0
0.2
0.4
0.6
0.8
1.0
Intens
ity_WL
G
Wavelength(nm)
WLG in the visible
WLG in the infrared
0 1 2 3 4 5 6 7 8 9 10
Time(min)
Pha
se
Jitte
r(ra
d)
-
Time(min)0 1 2 3 4 5 6 7 8 9
WLC
Path1
Time-delay
unit
M M
L L
LL
λ /2
BBO
BS2
BS1Sapphire
VND
OPA
Spectrometer
Path2
2000 2400 2800
990
1000
1010
1600 2000
900
910
920
Time (5s)
Wav
elen
gth
(nm
)
Wav
elen
gth
(nm
)
Intensity (arb.un)
100 200 300 400 500 600 700
(a)
(b)
0 500 1000 1500 2000 2500 3000 3500
-2
0
2
CE
ph
as
e (
rad
.)
Time(s)
(c)
-2
0
2
No
ise
ph
as
e (
rad
.)M
ixin
g p
ha
se
(ra
d.)
(b)
-2
0
2
(a)
476mrad
332mrad
223mrad
1800nm/1kHz φce&noise = φce + φnoise
Environment noise
Incident pulse instability:
• Energy fluctuation
• Beam direction
Accurate CEP stability measurement
Opt. Express, 16(26), 21383(2008)
Beam quality and HHG spectrum
Focus beam profile after SHG, measured by CCD
M2 is ~2 @ 1.8m after retrieval.
With the focus lens f=125mm, the 1/e2 focused beam diameter is ~0.14mm;
Pulse duration is similar to the driving pulse duration ~40fs;
Maximum pulse energy >1.2mJ for 6.6mJ pump energy in OPA2;
The focused intensity >21014W/cm2 from 1.6m to 1.9m.
18 16 14 12 10 8
1
10
100
1000
Inte
nsi
ty_
HH
G
Wavelength(nm)
1600
1700
1800
1900
600-nm-thick Zirconium foil as filter and
f=125mm focus lens.
Applications in Molecular HHG
Molecular HHG
Opt. Express 18, (2010);
Opt. Express 17, (2009) 15061-15067
Further development
Existed laser conditions:
PW level ultra-intense and ultra-fast laser;
High power few cycle laser with tunable working
wavelength and CEP stabilization;
Further development
Contrast ratio improvement
-60 -40 -20 0 20 40
1E-11
1E-10
1E-9
1E-8
1E-7
1E-6
1E-5
1E-4
1E-3
0.01
0.1
1
Inte
nsity(a
.u.)
Delay(ps)
Cleaned pulse
Initial pulse
-20 -15 -10 -5 0 5 10 15 20
1E-11
1E-10
1E-9
1E-8
1E-7
1E-6
1E-5
1E-4
1E-3
0.01
0.1
1
Inte
nsity(a
.u.)
Delay(ps)
Cleaned pulse
Initial pulse
J. R. Rygg, et al. Science 319, 1223 (2008)
1km, 107V/m
1cm, 1012V/m
Radiofrequency cavity (1 m-long) 3D PIC simulation of a plasma wave (UCLA)
100 umC
ourt
esy o
f W
. M
ori &
L.O
. S
ilva
Ez=
mec
p
e≈ 300 GV / m (for ne=1019 cm-3)
Laser accelerator
40 35 30 25 20
0.0
2.0x105
4.0x105
6.0x105
8.0x105
1.0x106
Inte
ns
ity
Wavelength(nm)
1700nm
1700nm+800nm
1700nm+800nm_delay
Attosecond science
Zeng et al., Phys. Rev. Lett. 98, 203901 (2007)
Attosecond science
10-9 s 10-12 s 10-15 s 10-18 s
In solids In molecules In atoms
73
Thank you
for your attention!