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February 4, 2021
Wiesbaden
Photoresist comparison NEGATIVE processing
Phase-out AZ5214EEU version
2 04.02.2021 Phase-out AZ5214E EU version
1. Spin curve comparison
2. Process parameters
3. Exposure Latitude
4. Linearity
5. Focus Latitude
Phase-out AZ5214E
EU version
ContentPhotoresist comparison NEGATIVE processing
spin speed/RPM
film thickness /µm
AZ 5214E [EU] AZ 5214E [JP]
500 4.32* 4.06*
1000 3.12 2.93
2000 2.18 2.06
3000 1.77 1.67
4000 1.53 1.44
5000 1.37 1.29
6000 1.26 1.18
* no ideal coating at this speed
04.02.2021 Phase-out AZ5214E EU version
Phase-out AZ5214E
EU versionSpin Curve comparison
1.00
1.50
2.00
2.50
3.00
3.50
4.00
4.50
5.00
0 1000 2000 3000 4000 5000 6000 7000
film
th
ickn
ess /
µm
spin speed /RPM
Spin curvesAZ 5214E [EU] vs. AZ 5214E [JP]
AZ 5214E [EU]
AZ 5214E [JP]
3
4 04.02.2021 Phase-out AZ5214E EU version
Phase-out AZ5214E
EU version
Process Parameters
negative processing
AZ 5214E [EU] AZ 5214E [JP]
Substrate 6'' bare silicon (HMDS prime)
Photoresist name AZ 5214E [EU] AZ 5214E [JP]
Film thickness 1.422 µm
RPM 4610 4182
Softbake 105°C / 60 s
Exposure Tool Nikon i-line Stepper
Dose to print
74.64 mJ/cm² 35.96 mJ/cm²
@ L / S: 1.00 µm
Flood exposure 900 mJ/cm², Hg lamp
Post Exposure bake 120°C / 60 s
Developer name AZ 726 MIF
Developing condition 1 x 60 s
5 04.02.2021 Phase-out AZ5214E EU version
Phase-out AZ5214E
EU versionExposure Latitude
0.88
0.92
0.96
1.00
1.04
1.08
1.12
10 35 60 85 110
CD
Mask /
µm
Exposure / mJ/cm2
Exposure Latitude (neg. mode)AZ 5214E [EU] vs. AZ 5214E [JP]
AZ 5214E [EU]
AZ 5214E [JP]
6 04.02.2021 Phase-out AZ5214E EU version
AZ 5214E [EU]
AZ 5214E [JP]
Phase-out AZ5214E
EU version
Exposure Latitude
negative processing
Exposure: 53 mJ/cm²
CD: 1.00 µm
Exposure: 75 mJ/cm²
CD: 1.00 µm
Exposure: 83 mJ/cm²
CD: 1.00 µm
Exposure: 97 mJ/cm²
CD: 1.00 µm
Exposure: 102 mJ/cm²
CD: 1.00 µm
Exposure: 28 mJ/cm²
CD: 1.00 µm
Exposure: 36 mJ/cm²
CD: 1.00 µm
Exposure: 41 mJ/cm²
CD: 1.00 µm
Exposure: 47 mJ/cm²
CD: 1.00 µm
Exposure: 52 mJ/cm²
CD: 1.00 µm
7 04.02.2021 Phase-out AZ5214E EU version
Phase-out AZ5214E
EU versionLinearity
0.60
0.80
1.00
1.20
1.40
1.60
1.80
2.00
0.60 0.80 1.00 1.20 1.40 1.60 1.80 2.00
CD
Resis
t /
µm
CD Mask / µm
Linearity (neg. mode)AZ 5214E [EU] vs. AZ 5214E [JP]
AZ 5214E [EU]
AZ 5214E [JP]
8 04.02.2021 Phase-out AZ5214E EU version
AZ 5214E [EU]
AZ 5214E [JP]
Phase-out AZ5214E
EU version
Linearity
negative processing
CD: 0.55 µm
Exposure: 75 mJ/cm²
CD: 0.60 µm
Exposure: 75 mJ/cm²
CD: 0.65 µm
Exposure: 75 mJ/cm²
CD: 0.70 µm
Exposure: 75 mJ/cm²
CD: 0.75 µm
Exposure: 75 mJ/cm²
CD: 0.55 µm
Exposure: 36 mJ/cm²
CD: 0.60 µm
Exposure: 36 mJ/cm²
CD: 0.65 µm
Exposure: 36 mJ/cm²
CD: 0.70 µm
Exposure: 36 mJ/cm²
CD: 0.75 µm
Exposure: 36 mJ/cm²
9 04.02.2021 Phase-out AZ5214E EU version
AZ 5214E [EU]
AZ 5214E [JP]
Phase-out AZ5214E
EU version
Linearity
negative processing
CD: 0.80 µm
Exposure: 75 mJ/cm²
CD: 0.90 µm
Exposure: 75 mJ/cm²
CD: 1.00 µm
Exposure: 75 mJ/cm²
CD: 1.10 µm
Exposure: 75 mJ/cm²
CD: 1.20 µm
Exposure: 75 mJ/cm²
CD: 0.80 µm
Exposure: 36 mJ/cm²
CD: 0.90 µm
Exposure: 36 mJ/cm²
CD: 1.00 µm
Exposure: 36 mJ/cm²
CD: 1.10 µm
Exposure: 36 mJ/cm²
CD: 1.20 µm
Exposure: 36 mJ/cm²
10 04.02.2021 Phase-out AZ5214E EU version
AZ 5214E [EU]
AZ 5214E [JP]
Phase-out AZ5214E
EU version
Linearity
negative processing
CD: 1.30 µm
Exposure: 75 mJ/cm²
CD: 1.40 µm
Exposure: 75 mJ/cm²
CD: 1.50 µm
Exposure: 75 mJ/cm²
CD: 2.00 µm
Exposure: 75 mJ/cm²
CD: 3.00 µm
Exposure: 75 mJ/cm²
CD: 1.30 µm
Exposure: 36 mJ/cm²
CD: 1.40 µm
Exposure: 36 mJ/cm²
CD: 1.50 µm
Exposure: 36 mJ/cm²
CD: 2.00 µm
Exposure: 36 mJ/cm²
CD: 3.00 µm
Exposure: 36 mJ/cm²
11 04.02.2021 Phase-out AZ5214E EU version
Phase-out AZ5214E
EU versionFocus Latitude
0.84
0.88
0.92
0.96
1.00
1.04
1.08
1.12
1.16
-1.70 -1.50 -1.30 -1.10 -0.90 -0.70 -0.50 -0.30 -0.10 0.10 0.30 0.50 0.70
CD
Mask /
µm
Focus / µm
Focus Latitude (neg. mode)AZ 5214E [EU] vs. AZ 5214E [JP]
AZ 5214E [EU]
AZ 5214E [JP]
12 04.02.2021 Phase-out AZ5214E EU version
AZ 5214E [EU]
AZ 5214E [JP]
Phase-out AZ5214E
EU version
Focus Latitude
negative processing
Focus: -1.5 µm
Exposure: 75 mJ/cm²
Focus: -1.1 µm
Exposure: 75 mJ/cm²
Focus: -0.7 µm
Exposure: 75 mJ/cm²
Focus: -0.1 µm
Exposure: 75 mJ/cm²
Focus: 0.3 µm
Exposure: 75 mJ/cm²
Focus: -1.5 µm
Exposure: 36 mJ/cm²
Focus: -1.1 µm
Exposure: 36 mJ/cm²
Focus: -0.7 µm
Exposure: 36 mJ/cm²
Focus: -0.1 µm
Exposure: 36 mJ/cm²
Focus: 0.3 µm
Exposure: 36 mJ/cm²
13 04.02.2021 Phase-out AZ5214E EU version
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