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Semiconductor Memories
Classification of Memory Devices
Introduction
©Loberg
Read Write Memories Non Volatile RWM Read Only Memory
Static RAM
Dynamic RAM
Random Access Non-Random Access
FIFO
LIFO
Shift Register
EPROM
EEPROM
FLASH
Mask-programmed Programmable (PROM)
"Combinational Logic"
1
nm ×2ROM
n outputs (data) m inputs (address Ai = 2m combinations)
Mm =2
mm 2×decoder
0W1W
1−MW2−MW
0A1A
1−mA2−mA
Encoder
Memory matrix
0D1D1−nD 2−nD
n-bit data m-bit address
Linear, one-dimensional addressing Word-lines
Address lines
Data lines
mnmnmn
=><
ROM Cell
Wj
Di
memory core
To Sense Amplifiers
ROM (Read Only Memory)
Semiconductor Memories
©Loberg
Linear Addressing
2
The Cell is designed so that a 0 or 1 is presented to the bit line Di upon activation of its word line Wj .
ROM Cell
Wj
Di
Diode-based ROM Cell
MOSFET-based ROM Cell
BJT-based ROM Cell
ROM Cell
Semiconductor Memories
©Loberg
ROM (Read Only Memory)
3
Diode-based ROM Cell
ROM Cell
Wj
Di
1 0 Wj
Di Di-1
Cell content is 1
Cell content is 0
R R ( ) DWjDi VVV −= 1)1(
CWj
CDi CDi-1
VD
Current
Disadvantage of the diode cell : No isolation between the word line Wj and the bit line Di .
The Wj driver must provide quite high current to charge capacitance Ctot .
∑=
+≈n
1iDiWj(max)tot CCC
n = number of data bits This approach works only for small memories.
Passive cell device
( And discharge CWj )
Semiconductor Memories
©Loberg
ROM (Read Only Memory)
ROM Cell
4
MOSFET-based ROM Cell
ROM Cell
Wj
Di
1 0
Wjtot CC ≈(max)
Word-line driver : Charge and discharge the word-line capacitance CWj .
NMOS transistor Qi : All output-driving current. Charge the bit-line capacitance CDi .
Active cell device
Wj
Di Di-1
Cell content is 1 Cell content
is 0
R R DD)1(Di VV ≈
CWj
CDi CDi-1
Current VDD
Qi
D
S
G
"Source follower implementation" OR ROM
Semiconductor Memories
©Loberg
ROM (Read Only Memory)
ROM Cell
5
MOSFET-based ROM Cell
ROM Cell
Wj
Di
0 1
Active cell device
Wj
Di Di-1
Cell content is 0
Cell content is 1
0V )0(Di ≈
CWj
CDi CDi-1
Current
VDD
D
S
G
DD)1(Di VV ≈
Pull-up devices
NOR ROM "Pull-down device implementation"
Qi Word-line driver : Charge and discharge the word-line capacitance CWj .
NMOS transistor Qi : Discharge the bit-line capacitance CDi .
NMOS
VDD
Default value of the output is 1 Good isolation between word and bit line
Semiconductor Memories
©Loberg
ROM (Read Only Memory)
ROM Cell
6
BJT-based ROM Cell
Used in early bipolar roms
Mask programmable connections
Multiple Emitter Transistor
Wj
Wj+1
Wj+2
Wj+3 D0 D1 D2
R
OR ROM
2m multiple-emiter transistors if linear addressing is used.
Wj
Wj+1
Wj+2
VDD
VDD
D0 D3 D1 D2
Wj+3
Semiconductor Memories
©Loberg
ROM (Read Only Memory)
ROM Cell
7
Only one mask layer, the contact mask, is used to program the memory array.
The precence of a metal contact to the bit line creates a 0-cell, while its absence indicate a 1-cell.
NOR ROM
Threshold programming
NOR ROM The threshold (VTO) of the transistor (1-cell) is selectively raised to value higher than the voltage swing of the word line Wj .
(VTO = 7V for 5V supply voltage)
Think about mass-production
Programming the ROM Cell
Semiconductor Memories
©Loberg
ROM (Read Only Memory)
8
mm 2×decoder
0W1W
1−MW2−MW
0A1A
1−mA2−mA
Memory matrix
0D1D7D 6D
8-bit data
m-bit address
M m = 2
long if m is large
short Aspect ratio of the memory is not close to the unity.
Problems
The shape of storage array is an unacceptable.
Solution is 2-dimensional addressing
X Y
Aspect ratio of the memory is close to the unity. Smaller decoders. An example of one-dimensional addressing
One-dimensional addressing
Semiconductor Memories
©Loberg
ROM (Read Only Memory)
9
A0 AK-1
K2N ⋅
K2N ⋅
Sense Amps/Drivers
Column decoder
Row
dec
oder
AK
Am-1
Km2 −
The number of word lines
Storage Cell
Bit line
Word line
N Output bits DN-1 - D0
An example of 2048 bit ROM (512x4 organization)
A6 A7
328424 3 =⋅=⋅
Sense Amps/Drivers
Row
dec
oder
A0
A5
6426 = The number of word lines
4 Output bits
D0
W0
W63
A8
D1 D2 D3
8X1 8X1 8X1 8X1
The number of bit lines
Four 8X1 Multiplexers
2k-bit memory
64 X 32 matrix
CS
Two-dimensional addressing
Semiconductor Memories
©Loberg
ROM (Read Only Memory)
10
Two 512 X 4-bit ROM One 512 X 8-bit ROM
A8 - A0
A8 - A0 A8 - A0
CS CS
D0 D3 D4 D7
D3 - D0 D3 - D0 512X4 512X4
Word Expansion
Semiconductor Memories
©Loberg
ROM (Read Only Memory)
11
A8 - A0
A8 - A0 A8 - A0
CS CS D3 - D0 D3 - D0 512X4 512X4
D0 D1 D2 D3
A8 - A0
CS D3 - D0 512X4
A8 - A0
CS D3 - D0 512X4
2-to
-4
deco
der A9
A10
0
3
2kX4-bit Address space "Glue logic"
Address Expansion
Semiconductor Memories
©Loberg
ROM (Read Only Memory)
12
Applications
Look-up Tables
Sequence Generators
Waveform Generators
Character Generators
Stored Programs
Combinational Logic
Semiconductor Memories
©Loberg
ROM (Read Only Memory)
13
Write Once device : OTP ROM (One Time Programmable)
This is most often accomplished by introducing fuses in the memory cell. (nichrome, polysilicon, or other conductors)
UV EPROM (NVRW memory) without erasing window. Cheap plastic package.
PROM Cell structure allows the customer to program the memory one time.
Programmable ROMS (PROMS)
Semiconductor Memories
©Loberg
Nonvolatile Read-Write Memories
Introduction
14
NVRW memories The memory core consists of an array of modified transistors which are programmed by selectively disabling or enabling some of them.
The threshold of the transistor is altered electrically.
The memory must be erased before next programming round.
The Floating-Gate Transistor
Several Times Writable : NVRW memories (Nonvolatile Read-Write Memories)
Nonvolatile Read-Write Memories
Introduction
Semiconductor Memories
©Loberg
Programmable ROMS (PROMS)
15
The structure is similar to a traditional MOS device, except that an extra polysilicon strip is inserted between the gate and channel.
Schematic Symbol
Programming
S
D
G
V20V20 Electrons are trapped on the floating gate.
It results in higher VTO
GATE FLOATING GATE
oxtoxt
+n +npSubstrate
Device cross-section of the FAMOS
Source Drain
2SiO
Floating-gate Avalanche-injection MOS Memory Cell Type (FAMOS)
Erasing
UV light
Semiconductor Memories
©Loberg
Nonvolatile Read-Write Memories
16
UV-EPROM
EPROM is erased by shining ultraviolet light on the Cells through the transparent window in the package.
The example UV-EPROM chip
Cell Array
Pin 1 Pin 40
Pin Configuration
Typical programming time :
word/s105 µ−
Mainly because of UV erasing.
Erasing takes time typically up to 1 hour.
Ceramic Packages
"Off-system" erasure procedure.
Erasable-Programmable ROM (EPROM)
Semiconductor Memories
©Loberg
Nonvolatile Read-Write Memories
Erase/Write cycles is generally limi- ted to a maximum of one thousand.
17
Electrically-Erasable-Programmable ROM (EEPROM, E2PROM)
FLOTOX transistor
GATE FLOATING GATE
nm10
+n +npSubstrate
Source Drain
2SiO
nm3020−
Schematic Symbol
Memory Cell Type (FLOTOX)
The number of Erasing and Programming cycle is limited
Semiconductor Memories
©Loberg
Nonvolatile Read-Write Memories
18
Read-Write Memories
Read and Write time : Independent of memory location. Memory access time
Memory cycle time Minimum interval of time reguired between successive memory operations.
Volatile Nonvolatile Local Power
Supply
Inside the package
Large dimensions
Static RAM
Dynamic RAM
Static memory cell
Dynamic memory cell
CS
Basic one-transistor cell Needs refreshing
S
Q R
Q Q Q
Basic Storage Cells NMOS CMOS
Introduction
Semiconductor Memories
©Loberg 19
Linear selection Assumption :
S Q Read Data Out
R
Write Data In
Write Enable
X Address
Write Operation : Write Data In
Write Enable
X Address
0 1
S R Q 0 1
Read Data Out 0 1
Read Operation : Set X Address to 1.
Static RAM Cell
Semiconductor Memories
©Loberg
Read-Write Memories
20
Static RAM Cell Linear selection
S Q
R
Write Data In DI
Write Enable WE
X Address
OC
Read Data Out DO
nxm dec.
DO DI
WE
+VCC
m x 1 organized RAM
iX
Address Lines
Semiconductor Memories
©Loberg
Read-Write Memories
21
R
S
DDV+
S
Q R
Q NMOS NOR gates
R
S
DDV+
S
Q R
Q CMOS NOR gates
Semiconductor Memories
©Loberg
Read-Write Memories
Static RAM Cell
22
iX1Q
DDV+
iX2Q
3Q 4Q5Q 6Q To R/W=1 of all
cells in column j To R/W=0 of all cells in column j
A static CMOS memory cell
Q Q
iX iX
The 6-MOS Memory Cell
Semiconductor Memories
©Loberg
Read-Write Memories
Static RAM Cell
23
2-dimensional addressing of RAM Cell
0-0
1-0 1-1
0-1
127-0 127-1
1-127
0-127
127-127
7-to-128 column decoder
7-to
-128
row
dec
oder
A0-A6
A7-A13
To R/W 1 amplifiers
To R/W 0 amplifiers
X0
X1
X127
Y0 Y1 Y127
1-bit line for column 1
0-bit line for column 1
Semiconductor Memories
©Loberg
Read-Write Memories
Static RAM Cell
24
2-dimensional addressing of RAM Cell
To R/W=1 of all cells in column 1
To R/W=0 of all cells in column 1
1X1Q
DDV+
1X2Q
3Q 4Q
5Q 6Q
7Q 8Q
13Q
15Q
1Y
DDV+
9Q
11Q 16Q
14Q
12Q
10Q
17Q
0-bit data line
1-bit data line
W0Write 1Write
W
W/R R/W 1 amplifiers R/W 0 amplifiers
Read 0 Read 1
1N 2N
Storage Cell (1-1) containing 6 NMOS transistors
Millman fig. 9-12
WE
Write 1
Write 0
Y1
X1
Read 0
Read 1
RAM Cell (1-1)
0-bit dataline 1-bit dataline
11917 Q,Q,Q
121017 Q,Q,Q
1513 Q,Q
1614 Q,Q
Semiconductor Memories
©Loberg
Read-Write Memories
Static RAM Cell
25
WE
W
S
Write Enable
Write ( Data Input, Din )
Sense ( Data Output, Dout )
Assumption : Cell contains a bit 1
1Q2Q Conducts (ON)
(OFF)
V0VandVV 2NDD1N ≈≈
To R/W=1 of all cells in column 1
To R/W=0 of all cells in column 1
1X1Q
DDV+
1X2Q
3Q 4Q
5Q 6Q
7Q 8Q
13Q
15Q
1Y
DDV+
9Q
11Q 16Q
14Q
12Q
10Q
17Q
0-bit data line
1-bit data line
W0Write 1Write
W
W/R R/W 1 amplifiers R/W 0 amplifiers
Read 0 Read 1
S
WE
W
1N 2N
S
1 0 0 1
Semiconductor Memories
©Loberg
Read-Write Memories
Static RAM Cell Cell contains a bit 1
26
Assumption : Cell contains a bit 0
1Q2Q
Conducts (ON)
(OFF)
V0VandVV 1NDD2N ≈≈
To R/W=1 of all cells in column 1
To R/W=0 of all cells in column 1
1X1Q
DDV+
1X2Q
3Q 4Q
5Q 6Q
7Q 8Q
13Q
15Q
1Y
DDV+
9Q
11Q 16Q
14Q
12Q
10Q
17Q
0-bit data line
1-bit data line
W0Write 1Write
W
W/R R/W 1 amplifiers R/W 0 amplifiers
Read 0 Read 1 S
WE
W
0 1 0 1
1N 2N
W
Semiconductor Memories
©Loberg
Read-Write Memories
Static RAM Cell Cell contains a bit 0
27
READ CYCLE
0WE =
caret'don1Write0Write ==
⇒
17Q ( OFF )
Due to the current through Q8 and Q4, the voltage drop over Q12 is practicaly VDD .
1S =
To R/W=1 of all cells in column 1
To R/W=0 of all cells in column 1
1X1Q
DDV+
1X2Q
3Q 4Q
5Q 6Q
7Q 8Q
13Q
15Q
1Y
DDV+
9Q
11Q 16Q
14Q
12Q
10Q
17Q
0-bit data line
1-bit data line
W0Write 1Write
W
W/R R/W 1 amplifiers R/W 0 amplifiers
Read 0 Read 1
S=1
WE=0
W
1N 2N
S=0
1 0 0 1
off
1 0
0
Current to the Ground
1 1
1
1
0
Voltage Drop over Q12
W
Zero Current
14Q (OFF) ⇒
V0V 14GS ≈
1YX 11 ==
Semiconductor Memories
©Loberg
Read-Write Memories
The Read Cycle of the (1-1) RAM Cell (2-dimensional addressing) Static RAM Cell
28
WRITE CYCLE
0W,1Wand1WE ===
1YX 11 ==
( )57681017 QQQQQQ ( ON )
To R/W=1 of all cells in column 1
To R/W=0 of all cells in column 1
1X1Q
DDV+
1X2Q
3Q 4Q
5Q 6Q
7Q 8Q
13Q
15Q
1Y
DDV+
9Q
11Q 16Q
14Q
12Q
10Q
17Q
0-bit data line
1-bit data line
W0Write 1Write
W
W/R R/W 1 amplifiers R/W 0 amplifiers
Read 0 Read 1
S
WE=1
W=1
1N 2N
S
1 0 0 1
off
1 0
0
Current to the Ground
1 1
1
1
0
Voltage Drop over Q12
W=0
Zero Current
( 1 to Cell )
on on
Voltage Drop over Q4
on
on on V0V 2N ≈ ⇒ OFFQ1 =
DD1N VV ≈
0WE0YX 11
===End of WR-cycle
8765 QQQQ ( OFF )
ONQOFFQ 21 == Cell=1
Semiconductor Memories
©Loberg
Read-Write Memories
The Write (-1-) Cycle of the (1-1) RAM Cell (2-dimensional addressing) Static RAM Cell
29
One-MOSFET Dynamic RAM-Cell
C1
iX
jY
To R/W amplifiers
Data bit or Column line
Row line
C2
Basic one-transistor cell
One data bit line ( )1VYX ji ==WRITE CYCLE
Data bit line : ( ) ( )1VV1V 1C =⇒
Data bit line : ( ) ( )0VV0V 1C =⇒
( )1VYX ji ==READ CYCLE
Write amplifier set the level of the data bit line
The read amplifier (sense amp.) detects the voltage level of the data bit line: 1C
21
1 VCC
CV+
=
112 VVCC <<⇒>>
is capacitance of the data bit line
Where 2C
Read cycle destroys the content of memory cell Write original content back
Leackage current Refresh time ms
Semiconductor Memories
©Loberg
Read-Write Memories
Dynamic RAM Cell
30
The End
31